On August 24, Maiwei issued a record of investor activities. In the
first half of this year, Maiwei realized operating income of 4.213 billion yuan, down 13.48% year-on-year; net profit of 394 million yuan, down 14.59% year-on-year; gross profit rate rose from 26.92% in the same period last year to 33.74%.
The original text is as follows:
1. What is the company's layout in the semiconductor field? What is the reason for the faster progress?
Answer: In the early stage, the company has formulated a strategic layout of three vertical and three horizontal lines, based on the three key technology platforms of vacuum, laser and precision equipment, facing the three major industries of solar photovoltaic , display and semiconductor. Since its listing at the end of 2018, the company has begun to lay out the pan-semiconductor field-display, packaging and semiconductor wafers. The company has a strategic layout in the semiconductor field with huge investment. The reason for the company's rapid progress is that it has adopted a differentiated development path, focusing on areas where other companies have not yet laid out or lack of competitiveness, while focusing on key technology nodes and customer collaborative R & D and forward-looking layout. In addition, the team's efforts and efficient execution are also key factors for rapid development.
2. How to understand the company's differentiated layout in the field of semiconductor front?
Answer: The company is very prudent in choosing the layout of differentiated products. Taking selective etching as an example, although the consumption is relatively small at this stage, with the advancement of technology nodes, whether it is storage or logic, the subsequent consumption will become larger and larger. This is also the reason for choosing atomic deposition as the main direction of the company's thin film deposition. Atomic layer deposition (ALD) is used for the deposition of deep holes, lateral nanoscale channels and smaller pitch films in the device structure. In short, the company is focusing on the future development direction of technology nodes to do the differentiated layout of equipment.
3. Can you briefly introduce the application of selective etching?
A: Selective etching is widely used in 3D flash memory, memory, and advanced logic. In the process of technology node promotion, there are some problems in plasma etching, such as no difference in etching, easy damage to non-target materials, poor material selectivity and insufficient etching selectivity ratio. The company's selective etching is a dry chemical etching, which can suppress the physical damage caused by ion bombardment to the greatest extent and meet the requirements of customers for fine and low-damage etching process.
4. What is the progress of HJT battery efficiency improvement?
Answer: The new HJT battery technologies promoted by the company, such as photonic sintering, PED and edge etching, are progressing smoothly. The company's laboratory has completed the test and installed and debugged at the customer's place. The company believes that the average power of HJT components is 780W and the maximum power is close to 800W by the end of the year.
5. How does the company view the development trend of photovoltaic silver-free/less silver in the future?
Answer: The company believes that in the future, the battery back paste technology will gradually develop from silver-coated copper paste to pure copper paste. At present, the silver content of silver-coated copper paste used on the back of HJT battery has been reduced to less than 15%. It is expected to realize the application of pure copper paste on the back next year, and it is pure copper paste without seed layer. At present, the front metallization technology mainly focuses on the two directions of silver-coated copper paste and single-sided copper electroplating, and the copper electroplating technology still needs further efforts in improving efficiency to prove its competitive advantage over silver-coated copper paste. Through the application of silver-coated copper paste and subsequent pure copper paste, the amount of silver used in HJT battery technology, that is, the cost of metallization, will be greatly reduced.
6. How does the company view the development trend of overseas photovoltaic manufacturing?
Answer: Because the heterojunction technology is highly automated and unmanned, the process is simple, and the manufacturing yield is high. Relatively speaking, HJT technology is very advantageous in overseas developed countries and some areas suitable for the characteristics of HJT technology. The company will maintain continuous communication with overseas customers, and follow-up orders are expected to gradually land.
7. How does the company judge the progress of perovskite tandem battery technology?
Answer: At present, different types of customers are prudently promoting perovskite tandem battery technology, including the strategic layout of the original industry customers and the promotion of new entrants as the main business. The company firmly believes that the mass production technology of silicon-based perovskite/heterojunction tandem solar cells is the sustainable development direction of the photovoltaic industry .
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